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freepatentsonline.com: Cleaning and liquid contact with solids


Residential dishwasher
A dishwasher that fits within the conventional U.S. residential dishwasher counter space and uses the conventional U.S. residential power supply to achieve within a convenient cycle time the same standard of sanitation as set forth for commercial and residential hot water sanitizing dishwashers.

Process for treatment and extraction of organic cork compounds by a dense fluid under pressure
Process for the treatment of cork or a cork-based material particularly with a view towards extracting contaminating organic compounds, in which said cork or said cork-based material is put into contact with a dense fluid under pressure at a temperature of from 10 to 120° C. and at a pressure of from 10 to 600 bars. Manufacturing installation for parts made of cork or a cork-based material, such as bottle corks, comprising an installation for treatment or extraction by putting the said cork or the said material into contact with a dense fluid under pressure.

Multiple wash zone dishwater
The invention relates to a dishwasher with a spray manifold fixedly mounted to one of the walls and having multiple circular nozzles, each circular nozzle having multiple openings configured to direct a spray of wash liquid laterally to provide a first wash zone.

Cleaning of tray columns which have been used for rectificatively treating liquids comprising (meth)acrylic acid and/or esters thereof
In process for cleaning tray columns which are used for the purposes of rectifiying liquids comprising (meth)acrylic compounds, a basic liquid is conveyed downward through the tray column and a gas is passed through the column in countercurrent to the basic liquid at an average gas phase differential pressure over all trays of at least 0.5 mbar/tray.

Portable ionizer
A portable ionizer is arranged for generating ionized air in an area of a user's fingers. The portable ionizer includes a battery-powered oscillator coupled via a high voltage conversion circuit to a positive electrode and a negative electrode for generating positive and negative ions. A fan positioned near the positive and negative electrodes is arranged providing a positive and negative ion flow path to the area of the user's fingers.

Combined contact lens case and solution storage device
Storage device for storing contact lenses and contact lens solution including a case defining a reservoir for contact lens solution and a pair of contact lens retaining compartments for retaining contact lenses. The case includes a mechanism for causing a stream of contact lens solution to flow from the reservoir to an exterior of the case (for use when rinsing and/or cleaning the contact lens) and another mechanism for causing the contact lens solution to flow from the reservoir into the compartments (for use when storing the contact lenses in the compartments). These mechanisms can be alternatively enabled depending on the particular use sought for the contact lens solution.

Wet etching apparatus and method
A wet etching apparatus and method to shorten processing time and to eliminate formation of unintended mask pattern are described. In the conventional art, after a mask pattern is formed, alien substances such as water mist or stain are left on the substrate. The alien substances act as an etching block in the wet etching process. This generates an unintended mask pattern. The present invention uses ultraviolet light to remove the alien substances prior to the etching process. When the alien substances are removed, the intended mask pattern is generated after the etching process. The wet etching device according to the present invention includes an ultraviolet cleaner and a conveyor to convey substrates to and from the ultraviolet cleaner. Spaces for the ultraviolet cleaner and the conveyor are created in the wet etching apparatus by reducing space for cassettes and reducing space required by the loader. As a result, alien substances can be removed without the need for separate sets of equipment, which reduces processing time, simplifies the process, and increases both productivity and reliability.

Floor cleaning and gloss enhancing compositions
The present invention relates to compositions for cleaning floors. In particular, it relates to aqueous compositions for one-step cleaning and gloss enhancement of wood surfaces, especially floors. The inventive compositions comprise specific levels of a class of copolymer, chitosan, or mixtures thereof, and specific levels of surfactant. The cleaning benefits are delivered every time the compositions are used; the gloss benefits are provided over three to four cleanings and are easily strippable.

Etch apparatus
In a process using a hot phosphoric acid etchant ( 12 ) to etch silicon nitride on a semiconductor wafer ( 15 ) submerged in a tank ( 11 ) of the etchant ( 12 ), a recirculating path is established for the etchant ( 12 ). A porous filter ( 35 ) is coated with silicon nitride and installed in the recirculating path. As the etchant ( 12 ) in the recirculating path flows through the porous filter ( 35 ), the silicon nitride on the porous filter ( 35 ) dissolves into the etchant ( 12 ). In the tank ( 11 ), the silicon nitride dissolved in the etchant ( 12 ) significantly suppresses the etch of silicon dioxide on the semiconductor wafer ( 15 ), thereby enhancing the etch selectivity of the process. Monitoring and maintaining the concentration of the silicon nitride in the etchant ( 12 ) stabilizes the etch selectivity of the process.

Thin film removing device and thin film removing method
A thin film removing device and a thin film removing method are capable of removing straight parts of a thin film formed on a square substrate from corners of the substrate, and of suppressing the formation of mists. An approach stage 20 having flat stage plates 23 capable of being disposed substantially flush with the surface of a substrate M mounted on a support table 22 is positioned close to the substrate M mounted on the support table 22 . Removing nozzles 30 jet a solvent toward edge parts of the substrate M and suck a solution produced by dissolving part of the resist in the solvent while the removing nozzles 30 are moved along side edges of the substrate M and the approach stage 20 disposed close to the substrate M. Thus, the removing nozzles 30 jet the solvent uniformly over the edge parts and corners of the substrate M and suck the solution without changing modes of jetting the solvent and sucking the solution. Consequently, straight parts of a thin film formed on the square substrate M can be removed from the corners of the substrate M, and the formation of mists can be suppressed.